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http://hdl.handle.net/123456789/6177| Title: | Simulation studies of plasmon enhanced evanescent near-field optical lithography |
| Authors: | Sefa-Ntiri, B. Docker, P. Ward, M.C. Prewett, P.D. |
| Keywords: | Surface plasmons hotonics Evanescent field |
| Issue Date: | 2005 |
| Publisher: | University of Cape Coast |
| Abstract: | A finite element analysis (FEA) of surface lasmon polariton (SPP) assisted evanescent near field optical lithography (ENFOL) is described. A gold on silicon nitride nanostructured, low-stress, conformable mask is used to control the coupling etween surface lasmons (SPs) and the incident light, in conjunction with an optically active resist, to couple the SPs and the transmitted evanescent field for in lithography |
| Description: | 4p:, ill. |
| URI: | http://hdl.handle.net/123456789/6177 |
| ISSN: | 23105496 |
| Appears in Collections: | Department of Physics |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Enhanced Evanescent Near Field Optical Lithography with Embedded Metal Masks.pdf | Article | 166.35 kB | Adobe PDF | View/Open |
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