Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/6177
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dc.contributor.authorSefa-Ntiri, B.-
dc.contributor.authorDocker, P.-
dc.contributor.authorWard, M.C.-
dc.contributor.authorPrewett, P.D.-
dc.date.accessioned2021-10-11T10:41:50Z-
dc.date.available2021-10-11T10:41:50Z-
dc.date.issued2005-
dc.identifier.issn23105496-
dc.identifier.urihttp://hdl.handle.net/123456789/6177-
dc.description4p:, ill.en_US
dc.description.abstractA finite element analysis (FEA) of surface lasmon polariton (SPP) assisted evanescent near field optical lithography (ENFOL) is described. A gold on silicon nitride nanostructured, low-stress, conformable mask is used to control the coupling etween surface lasmons (SPs) and the incident light, in conjunction with an optically active resist, to couple the SPs and the transmitted evanescent field for in lithographyen_US
dc.language.isoenen_US
dc.publisherUniversity of Cape Coasten_US
dc.subjectSurface plasmons hotonicsen_US
dc.subjectEvanescent fielden_US
dc.titleSimulation studies of plasmon enhanced evanescent near-field optical lithographyen_US
dc.typeArticleen_US
Appears in Collections:Department of Physics

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